Performance of a New 14.5 GHz IMP ECR Ion Source

Zhao H.W., Zhang X.Z., Liu Z.W., Guo X.H., Zhang Z.M., Gao J.Y., Zhao Y.B.., Wang Y.F.
Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou, 730000, P.R. CHINA

A new 14.5 GHz ECR ion source has been constructed for IMP cyclotron over the last two years. The source was designed and tested by making use of the latest results from ECR ion source development, such as high mirror magnetic field, large plasma volume, better condition for extraction of highly charged ions, biased probe and Aluminium tube to provide extra cold electrons. After first commissioning, typically 100 emA of O7+, 160 emA of Ar11+ and 50 emA of Xe26+ could be produced with rf power 800 W. The metallic ion beam production is realized by means of metal evaporation ovens and volatile compounds method through axial access. The results will be presented. Some further modification and improvements to the ion source are in consideration so as to achieve higher beam intensity with higher charge states.

Presenting Author : Zhao H.W.
Presentation : Oral
Thursday 09:30